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Journal of KWJS 2003;21(4):63-68.
Published online August 25, 2003.
A Development of SEM Applied Microjoining System
Il-Han Hwang, Suck-Joo Na
Abstract
Scanning electron microscopy (SEM) has been used as a surface measurement instrument and a tool for lithography in semiconductor process due to its high density localized beam. For those purposes, however, the maximum current of SEM is less than 100pA, which is not enough for material processing. In this paper SEM was modified to increase the amount of current reaching a specimen from gun part where current is generated, the possibility of applying SEM to material processing, especially microjoining, was investigated. The maximum current of SEM after modifications was measured up to 10㎂, which is about 105 times greater than before modifications. Through experiments such as eutectic solder wetting on thin 304 stainless steel foil and microjoining of 10㎛ thick 304 stainless steel, the intensity of electron beam of SEM proved to be great enough for material processing as heat source. And a tight jig system was found necessary to hold materials close enough for successful microjoining.


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